Modeling of chemical vapor infiltration rate considering a pore size distribution

Noboru Yoshikawa, James W. Evans

研究成果: Article査読

5 被引用数 (Scopus)

抄録

To analyze chemical vapor infiltration (CVI) rates, a simulation model (PC model) was proposed, which is capable of considering difficulties of densification in the internal regions of porous bodies and the pore closure phenomena. In the model, a fictitious tapered pore is constructed based on the pore size distribution of the preform body, and variation of the pore shape during the process is calculated. For simulation study, fictitious tapered pores were constructed using different pore size distribution functions of Gaussian, δ-function, and flat distribution, and their shapes and characteristics were compared. In the case of the Gaussian flat distribution (large dispersion), the fraction of fine pores was large and these pores became closed near their mouths. Reconversion of temporal fictitious pore shape into the pore distribution function was attempted and the PC model was successfully applied to monitor variations in the pore size distributions during the CVI process.

本文言語English
ページ(範囲)1485-1491
ページ数7
ジャーナルJournal of the American Ceramic Society
85
6
DOI
出版ステータスPublished - 2002 6

ASJC Scopus subject areas

  • Ceramics and Composites
  • Materials Chemistry

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