Microstructure in high-density MgB2 wires prepared by an internal Mg diffusion method

Yusuke Shimada, Yuuki Kubota, Satoshi Hata, Ken Ichi Ikeda, Hideharu Nakashima, Akiyoshi Matsumoto, Kazumasa Togano, Jahmahn Hur, Hiroaki Kumakura

研究成果: Article査読

13 被引用数 (Scopus)

抄録

Several reaction-induced diffusion processes to fabricate high-density MgB2 materials are developed, and the critical current density (Jc) has been notably enhanced. In this study, microstructure in high-density MgB2 wires fabricated by an internal Mg diffusion (IMD) process has been investigated. The inner reacted region of the wire heat-treated at 640 °C for 1 h shows dense polycrystalline MgB2 of 20-200 nm in grain sizes. Fine MgO and Mg2Si particles of 10-30 nm in sizes are dispersed in this region. On the other hand, the outer region near the Ta sheath is composed of unreacted B and SiC powders, fine MgO particles and small voids. Sizes of voids in the IMD MgB2 wire are small compared with the PIT MgB2 wire. Oxidation of Mg in the IMD process forms fine dispersion of MgO which may be effective for flux pinning.

本文言語English
論文番号5643189
ページ(範囲)2668-2671
ページ数4
ジャーナルIEEE Transactions on Applied Superconductivity
21
3 PART 3
DOI
出版ステータスPublished - 2011 6
外部発表はい

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • 凝縮系物理学
  • 電子工学および電気工学

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