抄録
An axisymmetric Wolter type mirror is used in a synchrotron radiation beamline to focus 150 eV soft x rays for microscopic x-ray photoelectron spectroscopy (XPS). The focusing characteristics are evaluated for x-ray source sizes of 1 mm, 200 and 120 μ m in diameter. In this evaluation, the Si(2p) photoelectrons from a Si sample are counted while a knife edge is scanned across the focal point of the mirror. The lateral resolution is 2 μm by the 25%-75% criterion, and 4μm by the full width at half-maximum definition in the beam intensity profile. The Wolter type mirror is expected to provide microscopic XPS techniques with micrometer to sub-micrometer resolution.
| 本文言語 | English |
|---|---|
| ページ（範囲） | 1244-1247 |
| ページ数 | 4 |
| ジャーナル | Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films |
| 巻 | 9 |
| 号 | 3 |
| DOI | |
| 出版ステータス | Published - 1991 1月 1 |
| 外部発表 | はい |
ASJC Scopus subject areas
- 凝縮系物理学
- 表面および界面
- 表面、皮膜および薄膜