Micropattern of inorganic film prepared by uv-irradiation and heat treatment of polyalkylsilyne film

Akira Watanabe, Yoshinori Nagai, Minoru Matsuda

研究成果: Article査読

9 被引用数 (Scopus)

抄録

A micropattern of inorganic thin film was formed by heat treatment of a polyalkylsilyne film at 300 °C after UV irradiation with photomask. The Si-Si chain of spin-coated polyalkylsilyne film was photooxidized by UV irradiation with photomask in air. The XPS spectra showed that the Si-O-Si chain of the UV-irradiated part changed into SÌO2 upon heat treatment in vacuo. On the other hand, the heat treatment changed the masked part into an a-Si-like structure with low optical band gap. The micrograph demonstrated lines of the irradiated area and spaces of the masked area.

本文言語English
ページ(範囲)L 452-L 454
ジャーナルJapanese journal of applied physics
34
4
DOI
出版ステータスPublished - 1995 4月

ASJC Scopus subject areas

  • 工学(全般)
  • 物理学および天文学(全般)

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