Mechanical quality factor enhancement in a silicon micromechanical resonator by low-damage process using neutral beam etching technology

Nguyen Van Toan, Tomohiro Kubota, Halubai Sekhar, Seiji Samukawa, Takahito Ono

研究成果: Article

25 引用 (Scopus)

抜粋

The fabrication and evaluation of silicon micromechanical resonators using neutral beam etching (NBE) technology is presented. An etching technique based on a low energy neutral beam of Cl2/F2/O2 is introduced for making nano-trench patterns on 5 μ

元の言語English
記事番号085005
ジャーナルJournal of Micromechanics and Microengineering
24
発行部数8
DOI
出版物ステータスPublished - 2014 8 1

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Mechanics of Materials
  • Mechanical Engineering
  • Electrical and Electronic Engineering

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