Mechanical properties and residual stress in AlN films prepared by ion beam assisted deposition

Yoshihisa Watanabe, Nobuaki Kitazawa, Yoshikazu Nakamura, Chunliang Li, Tohru Sekino, Koichi Niihara

研究成果: Conference article査読

14 被引用数 (Scopus)

抄録

The synthesis of AlN films with varied microstructures using nitrogen ion beam assisted deposition was described. The effect of ion beam energy on the mechanical properties and residual stresses of the films was studied under energies from 0.2 to 1.5 keV. A nano-indentation method revealed softening and plasticity in the films. The optical cantilever system showed a relaxation of residual stress. However, the films were in a compressive stress state independently from the beam energy. Granular structure films were found to be more easily relaxed than columnar structure films as a function of annealing temperature at 500 °C.

本文言語English
ページ(範囲)1567-1570
ページ数4
ジャーナルJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
18
4 II
DOI
出版ステータスPublished - 2000 7 1
イベント46th National Symposium of the American Vacuum Society - Seatlle, WA, USA
継続期間: 1999 10 251999 10 29

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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