抄録
The diffusion behavior of Al and Ni in Ni3Al with the L12-type crystal structure is examined by measuring intrinsic diffusion coefficients. First, interdiffusion coefficients are determined using Ni/NiAl diffusion couples forming a Ni3Al phase at the interface. The intrinsic diffusion coefficients are then determined from the interdiffusion coefficients and velocities of the Kirkendall interface with respect to the Matano plane through the Darken equation. It is shown that the intrinsic diffusion coefficients of Al and Ni in Ni3Al are of almost equal magnitude in the investigated temperature range (1423-1523 K). This conclusion is evaluated within the experimental error involved in the determination of the Matano plane. The self-diffusion coefficient of Al in Ni3Al is derived from the intrinsic diffusion coefficients of Al and Ni in Ni3Al and is compared with the estimation reported in the literature. It is shown that the present results support the diffusion mechanisms considering anti-site defects.
本文言語 | English |
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ページ(範囲) | 1571-1579 |
ページ数 | 9 |
ジャーナル | Acta Materialia |
巻 | 50 |
号 | 6 |
DOI | |
出版ステータス | Published - 2002 4月 2 |
ASJC Scopus subject areas
- 電子材料、光学材料、および磁性材料
- セラミックおよび複合材料
- ポリマーおよびプラスチック
- 金属および合金