Mass analysis of growth of AL 2O 3 thin films from low-temperature atomic layer deposition on woven cotton

Daisuke Hojo, Tadafumi Adschiri

研究成果: Article査読

3 被引用数 (Scopus)

抄録

Atomic layer deposition (ALD) at 100°C provides a conformal coating on woven cotton with a tortuous and complex surfaces. The woven structures are completely preserved and replicated with thin coating of Al 2O 3, even after removing the cotton templates. The replicated woven structures enable direct mass analysis of the cotton coating. Quantitative analysis reveals that the self-limiting reaction of ALD is ensured, even on tortuous cotton surfaces, except for early growth cycles. This unique feature of ALD assures conformal coating onto three-dimensional (3D) networks of cotton. The results demonstrate the possibility of a non-local methodology for evaluating the thickness of a coating on 3D objects at various stages of growth.

本文言語English
ページ(範囲)248-253
ページ数6
ジャーナルChemical Vapor Deposition
16
7-9
DOI
出版ステータスPublished - 2010 9

ASJC Scopus subject areas

  • Chemistry(all)
  • Surfaces and Interfaces
  • Process Chemistry and Technology

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