Magnetotransport properties of Co-Fe/Al-N/Co-Fe tunnel junctions with large tunnel magnetoresistance ratio

Tae Sick Yoon, Chong Oh Kim, Toshihiro Shoyama, Masakiyo Tsunoda, Migaku Takahashi

研究成果: Article査読

6 被引用数 (Scopus)

抄録

The investigation of the magnetotransport properties of tunnel junction with the structure of Ta 5 nm/Cu 20 nm/Ta 5 nm/Ni76Fe242 nm/Cu 5 nm/Mn75Ir25 10 nm/Co71Fe29 4 nm/Al-N/Co71Fe29 4 nm/Ni76Fe24 20 nm/Ta 5 nm was discussed. The local transport properties were studied using conducting atomic force microscope for Ta 5 nm/Cu 20 nm/Ta 5 nm/Ni 76Fe24 2 nm/Cu 5 nm/Mn75Ir25 inorder to clarify the annealing temperature dependence of TMR ratio. The leakage current was observed and the TMR ratio decreased, after annealing at 340°C. Tunnel magnetoresistance ratio (TMR) at 300°C was elucidated.

本文言語English
ページ(範囲)82-84
ページ数3
ジャーナルApplied Physics Letters
85
1
DOI
出版ステータスPublished - 2004 7 5

ASJC Scopus subject areas

  • 物理学および天文学(その他)

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