Magnetic Properties of Fe-M-O (M=Zr, Hf) Films with High Resistivity

Y. Hayakawa, K. Hirokawa, A. Makino

研究成果: Article

1 被引用数 (Scopus)


The magnetic properties of Fe-M-O (M=Zr, Hf) films with high electrical resistivity, prepared by the rf magnetron sputtering technique in an Ar+O2 atmosphere, were investigated. In the as-deposited state, low coercivities (Hc) in the range 30 to 100 A/m were obtained for Fe-Hf-O, and 160 to 240 A/m for Fe-Zr-O, in the composition range characterized by an O/M ratio of between 3 and 4. After annealing under optimum conditions in an external field of 160 kA/m, the results obtained for Fe54.9Hf11O34.1 and Fe65.3Zr8.9O25.8 included a saturation magnetization (Bs) of 1.2 T, an Hc of 64 A/m, and a μ at 100 MHz of 1600 for the former, and a Bs of 1.3 T, Hc of 73 A/m and μ at 100 MHz of 1000 for the latter. Further, the electrical resistivities of the films were much higher than those of known metallic soft magnetic films.

ジャーナルIEEE Translation Journal on Magnetics in Japan
出版ステータスPublished - 1994 1 1

ASJC Scopus subject areas

  • Engineering (miscellaneous)

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