Machinable ceramic substrate for CVD diamond coating

T. Abe, T. Takagi, Z. M. Sun, T. Uchimoto, J. Makino, H. Hashimoto

研究成果: Article査読

25 被引用数 (Scopus)

抄録

Newly developed machinable metallic ceramic titanium silicon carbide, Ti3SiC2, was successfully used as a substrate for CVD diamond coating. This metallic ceramic was synthesized from a mixed powder of Ti, Si and TiC. The powder was sintered in a graphite mold at 1573 K for 15 min under a constant pressure of 50 MPa. Two types of specimens, (1) a plate of 50-mm diameter for a linear slider and (2) a rod and ring pair for a rotating bearing of 8-mm diameter and 10-mm length were prepared. On the flat surface of the plate, CVD diamond film of approximately 10-μm thickness was deposited by the microwave CVD method. Diamond film was also deposited both on the inner surface of the ring and on the outer surface of the rod by the hot filament method. Diamond-coated surfaces of all specimens were polished up to a surface roughness, Ra, of approximately 0.2 μm. Coefficients of friction between the polished diamond plate and a stainless steel rail, specimen (1), and between the rotating rod and a stationary outer ring, specimen (2), were measured. The lowest coefficients of friction in both specimens were less than 0.01.

本文言語English
ページ(範囲)819-822
ページ数4
ジャーナルDiamond and Related Materials
13
4-8
DOI
出版ステータスPublished - 2004 4

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • 化学 (全般)
  • 機械工学
  • 材料化学
  • 電子工学および電気工学

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