Low-temperature chemical vapor deposition of YBa2Cu3Ox films

Hideaki Zama, Shunri Oda, Takayuki Miyake, Takeo Hattori

    研究成果: Article査読

    2 被引用数 (Scopus)

    抄録

    Low-temperature growth of YBa2Cu3Ox films by CVD has been investigated using Y (DPM)3, Ba (DPM)2 and Cu (DPM)2 as starting materials and N2O as an oxidizing agent. 123-perovskite structure has been prepared at a substrate temperature of 530°C. Superconducting films with zero-resistivity Tc of 15K and Tonset=87K has been obtained at Tsub=610°C and Tc=83K, Tonset=89K at Tsub=650°C. A 254nm-light has promoted decomposition of β-diketonate complex at Tsub=215°C.

    本文言語English
    ページ(範囲)2103-2104
    ページ数2
    ジャーナルPhysica C: Superconductivity and its applications
    185-189
    PART 3
    DOI
    出版ステータスPublished - 1991 12 1

    ASJC Scopus subject areas

    • Electronic, Optical and Magnetic Materials
    • Condensed Matter Physics
    • Energy Engineering and Power Technology
    • Electrical and Electronic Engineering

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