Low loss laminated polarization splitters for wavelengths longer than 1.3 μm prepared by plasma enhanced chemical vapor deposition

Yong Gi Lee; Takayuki Kawashima; Osamu Hanaizumi; Isao Takahashi; Jun Ichi Murota; Shojiro Kawakami

doi:10.1016/S0040-6090(96)09070-0

Low loss laminated polarization splitters for wavelengths longer than 1.3 μm prepared by plasma enhanced chemical vapor deposition

Yong Gi Lee, Takayuki Kawashima, Osamu Hanaizumi, Isao Takahashi, Jun Ichi Murota, Shojiro Kawakami

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研究成果: Article › 査読

抄録

We have decreased remarkably the insertion loss of a laminated polarization splitter (LPS) designed for wavelengths longer than 1.3 μm, which consists of a-SiC:H/SiO₂ multilayers prepared by plasma enhanced chemical vapor deposition. Previously fabricated LPSs have the problem of a large scattering loss because the surface of the multilayer film is not sufficiently flat; this is especially remarkable in the SiO₂ film. The flatness of the SiO₂ film is improved by optimization of the substrate temperature and flow rate of the source gases. The a-SiC:H film with a high refractive index and low absorption is obtained by optimizing the mixing of source gases at fixed substrate temperature. The total loss of a multilayer film at normal incidence is decreased from 1.22 × 10^-2 dB μm^-1 (previous work) to 1.4 × 10^-3 dB μm^-1. The insertion loss of the LPS is also decreased from 5.2 × 10^-2 dB μm^-1 (previous work) to 7 × 10^-3 dB μm^-1.

本文言語	English
ページ（範囲）	179-183
ページ数	5
ジャーナル	Thin Solid Films
巻	292
号	1-2
DOI	https://doi.org/10.1016/S0040-6090(96)09070-0
出版ステータス	Published - 1997 1 5

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Surfaces and Interfaces
Surfaces, Coatings and Films
Metals and Alloys
Materials Chemistry

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10.1016/S0040-6090(96)09070-0

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引用スタイル

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title = "Low loss laminated polarization splitters for wavelengths longer than 1.3 μm prepared by plasma enhanced chemical vapor deposition",

abstract = "We have decreased remarkably the insertion loss of a laminated polarization splitter (LPS) designed for wavelengths longer than 1.3 μm, which consists of a-SiC:H/SiO2 multilayers prepared by plasma enhanced chemical vapor deposition. Previously fabricated LPSs have the problem of a large scattering loss because the surface of the multilayer film is not sufficiently flat; this is especially remarkable in the SiO2 film. The flatness of the SiO2 film is improved by optimization of the substrate temperature and flow rate of the source gases. The a-SiC:H film with a high refractive index and low absorption is obtained by optimizing the mixing of source gases at fixed substrate temperature. The total loss of a multilayer film at normal incidence is decreased from 1.22 × 10-2 dB μm-1 (previous work) to 1.4 × 10-3 dB μm-1. The insertion loss of the LPS is also decreased from 5.2 × 10-2 dB μm-1 (previous work) to 7 × 10-3 dB μm-1.",

keywords = "Chemical vapour disposition, Multilayers, Optical properties, Silicon carbide",

author = "Lee, {Yong Gi} and Takayuki Kawashima and Osamu Hanaizumi and Isao Takahashi and Murota, {Jun Ichi} and Shojiro Kawakami",

note = "Funding Information: The authors thank Dr T. Sato for helpful discussions. They are also grateful to Y. Hirose for assistance. This study was carried out in the Laboratory for Electronic Intelligent Systems, Research Institute of Electrical Communication, Tohoku University. Parts of this study were supported by a Grant-in-Aid for Scientific Research from the Ministry of Education, Science, Sports and Culture of Japan. Copyright: Copyright 2018 Elsevier B.V., All rights reserved.",

year = "1997",

month = jan,

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doi = "10.1016/S0040-6090(96)09070-0",

language = "English",

volume = "292",

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T1 - Low loss laminated polarization splitters for wavelengths longer than 1.3 μm prepared by plasma enhanced chemical vapor deposition

AU - Lee, Yong Gi

AU - Kawashima, Takayuki

AU - Hanaizumi, Osamu

AU - Takahashi, Isao

AU - Murota, Jun Ichi

AU - Kawakami, Shojiro

N1 - Funding Information: The authors thank Dr T. Sato for helpful discussions. They are also grateful to Y. Hirose for assistance. This study was carried out in the Laboratory for Electronic Intelligent Systems, Research Institute of Electrical Communication, Tohoku University. Parts of this study were supported by a Grant-in-Aid for Scientific Research from the Ministry of Education, Science, Sports and Culture of Japan. Copyright: Copyright 2018 Elsevier B.V., All rights reserved.

PY - 1997/1/5

Y1 - 1997/1/5

N2 - We have decreased remarkably the insertion loss of a laminated polarization splitter (LPS) designed for wavelengths longer than 1.3 μm, which consists of a-SiC:H/SiO2 multilayers prepared by plasma enhanced chemical vapor deposition. Previously fabricated LPSs have the problem of a large scattering loss because the surface of the multilayer film is not sufficiently flat; this is especially remarkable in the SiO2 film. The flatness of the SiO2 film is improved by optimization of the substrate temperature and flow rate of the source gases. The a-SiC:H film with a high refractive index and low absorption is obtained by optimizing the mixing of source gases at fixed substrate temperature. The total loss of a multilayer film at normal incidence is decreased from 1.22 × 10-2 dB μm-1 (previous work) to 1.4 × 10-3 dB μm-1. The insertion loss of the LPS is also decreased from 5.2 × 10-2 dB μm-1 (previous work) to 7 × 10-3 dB μm-1.

AB - We have decreased remarkably the insertion loss of a laminated polarization splitter (LPS) designed for wavelengths longer than 1.3 μm, which consists of a-SiC:H/SiO2 multilayers prepared by plasma enhanced chemical vapor deposition. Previously fabricated LPSs have the problem of a large scattering loss because the surface of the multilayer film is not sufficiently flat; this is especially remarkable in the SiO2 film. The flatness of the SiO2 film is improved by optimization of the substrate temperature and flow rate of the source gases. The a-SiC:H film with a high refractive index and low absorption is obtained by optimizing the mixing of source gases at fixed substrate temperature. The total loss of a multilayer film at normal incidence is decreased from 1.22 × 10-2 dB μm-1 (previous work) to 1.4 × 10-3 dB μm-1. The insertion loss of the LPS is also decreased from 5.2 × 10-2 dB μm-1 (previous work) to 7 × 10-3 dB μm-1.

KW - Chemical vapour disposition

KW - Multilayers

KW - Optical properties

KW - Silicon carbide

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