Low-gas-pressure sputtering of CoPtCr-SiO2 granular films made by a sintered target without SiO2 powder

Shingo Sasaki, Shin Saito, Migaku Takahashi

研究成果: Article査読

2 被引用数 (Scopus)

抄録

A new low-Ar-gas-pressure (PAr) sputtering process is proposed for the preparation of granular metal-oxide films for use as perpendicular magnetic recording media. CoO and CoSi powders were used as the raw materials of the sintered target rather than SiO2 powder to obtain the O/Si ratio to 2 in a granular film under low PAr process. Strongly exchange-coupled media were obtained at PAr = 0.6 Pa using a conventional (Co)-(Pt)-(Cr)-(SiO2) target, while use of the proposed (Co)-(Pt)-(Cr)-(CoSi)-enriched(CoO) target adjusted the oxygen composition in the granular film, which resulted in the successful fabrication of well magnetically decoupled media at PAr = 0.6 Pa.

本文言語English
論文番号5518470
ジャーナルIEEE Magnetics Letters
1
DOI
出版ステータスPublished - 2010

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料

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