Light scattering by submicron particles on film-coated wafers

Hideyuki Kondo, Shigenari Yanagi, Kazushige Takaishi, Takayuki Shingyouji, Tatsuo Yoshinobu, Hiroshi Iwasaki

研究成果: Article査読

3 被引用数 (Scopus)

抄録

The intensity of light scattered by particles on film-coated wafers was measured as a function of film thickness using two types of particle counter with different optical configurations. The scattered light intensity was found to oscillate periodically with film thickness; the period of oscillation was in agreement with that of the reflectivity of the incident beam, and significant enhancement of scattering intensity was observed for thicknesses less than about 0.3 μm.

本文言語English
ページ(範囲)L616-L618
ジャーナルJapanese Journal of Applied Physics, Part 2: Letters
35
5 B
DOI
出版ステータスPublished - 1996
外部発表はい

ASJC Scopus subject areas

  • 工学(全般)
  • 物理学および天文学(その他)
  • 物理学および天文学(全般)

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