Lift-off patterning of thin Au films on Si surfaces with atomic force microscopy

Won Chul Moon, Tatsuo Yoshinobu, Hiroshi Iwasaki

研究成果: Conference article査読

4 被引用数 (Scopus)

抄録

We studied a new lift-off process of thin Au film on silicon surfaces in nanometer-scale, combining anodic oxidation patterning with AFM, deposition of Au thin film on the patterned substrate and chemical etching processes of the Si oxide underneath the Au film. For Au films of thickness of 2-5 nm, the Au films on the Si oxide patterns were left unbroken and bent down to stick to Si surface after the removal of the oxide by the chemical etching. For an Au film of 1 nm in thickness, it was possible to lift-off the Au film on oxide patterns of the lines and dots in nanometer-scale using Si oxide as a sacrificial mask. (C) 2000 Elsevier Science B.V.

本文言語English
ページ(範囲)119-123
ページ数5
ジャーナルUltramicroscopy
82
1-4
DOI
出版ステータスPublished - 2000 2
外部発表はい
イベントThe International Conference on Scanning Probe Microscopy, Cantilever Sensors and Nanostructures (SPM '99) - Seattle, WA, USA
継続期間: 1999 5 301999 6 1

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • 原子分子物理学および光学
  • 器械工学

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