Laser machining of special designed photopolymers - Photochemical ablation mechanism

Thomas Lippert, J. T. Dickinson, S. C. Langford, H. Furutani, H. Fukumura, H. Masuhara, T. Kunz, A. Wokaun

研究成果: Conference article査読

抄録

Photopolymers based on the triazeno chromophore group (-N=N-N<) have been developed. The absorption properties can be tailored for a specific irradiation wavelength (e.g. 308 nm XeCl laser). The photochemical exothermic decomposition yields high energetic gaseous products which are not contaminating the surface. The polymer can be structured with high resolution. No debris has been found around the etched corners. Maximum ablation rates of about 3 μm / pulse were achieved due to the dynamic absorption behavior (bleaching during the pulse). No physical or chemical modifications of the polymer surface could be detected after irradiation at the tailored absorption wavelength, whereas irradiation at different wavelengths resulted in modified (physical and chemical) surfaces. The etching of the polymer starts and ends with the laser pulse, shown by ns-interferometry, confirming that the acting mechanism is mainly photochemical. TOF-MS revealed fragments which are also totally compatible with a photochemical decomposition mechanism.

本文言語English
ページ(範囲)192-199
ページ数8
ジャーナルProceedings of SPIE - The International Society for Optical Engineering
3404
DOI
出版ステータスPublished - 1997 12 1
イベントALT 1997 International Conference on Laser Surface Processing - Limoges, France
継続期間: 1997 9 81997 9 12

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • 凝縮系物理学
  • コンピュータ サイエンスの応用
  • 応用数学
  • 電子工学および電気工学

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