Laser chemical vapor deposition of TiN film on Ti(C,N)-based cermet substrate using Ti(OiPr)2(dpm)2-NH3 system

Yu You, Akihiko Ito, Rong Tu, Takashi Goto

研究成果: Article査読

5 被引用数 (Scopus)

抄録

TiN films were prepared on Ti(C,N)-based cermet substrate by laser chemical vapor deposition using titanium isopropoxide dipivaloylmethane [Ti(OiPr) 2(dpm)2] and ammonia (NH3) as precursors. The effects of deposition temperature (Tdep) and laser power (P L) on the crystal phase, microstructure and adhesion were investigated. TiN film was prepared at Tdep > 903K (PL > 100 W). The microstructure of TiN film changed from rose-like grains to pyramid-like grains to aggregate grains with increasing PL and T dep. Highly adhesive film was obtained at moderate Tdep = 1047K (PL = 120 W).

本文言語English
ページ(範囲)310-313
ページ数4
ジャーナルJournal of the Ceramic Society of Japan
119
1388
DOI
出版ステータスPublished - 2011 4

ASJC Scopus subject areas

  • セラミックおよび複合材料
  • 化学 (全般)
  • 凝縮系物理学
  • 材料化学

フィンガープリント

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