Kinetic modeling of tungsten silicide chemical vapor deposition from WF6 and Si2H6: Determination of the reaction scheme and the gas-phase reaction rates

Takeyasu Saito, Keiji Oshima, Yukihiro Shimogaki, Yasuyuki Egashira, Katsuro Sugawara, Katsumi Takahiro, Shinji Nagata, Sadae Yamaguchi, Hiroshi Komiyama

研究成果: Article査読

6 被引用数 (Scopus)

フィンガープリント

「Kinetic modeling of tungsten silicide chemical vapor deposition from WF<sub>6</sub> and Si<sub>2</sub>H<sub>6</sub>: Determination of the reaction scheme and the gas-phase reaction rates」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

Engineering & Materials Science

Chemical Compounds