Interface structure of an epitaxial iron silicide on Si(111) studied with X-Ray diffraction

Tetsuroh Shirasawa, Kouji Sekiguchi, Yusaku Iwasawa, Wolfgang Voegeli, Toshio Takahashi, Ken Hattori, Azusa N. Hattori, Hiroshi Daimon, Yusuke Wakabayashi

研究成果: Article査読

5 被引用数 (Scopus)

抄録

Atomic structures of iron-silicide ultra-thin films epitaxial grown on Si(111) were investigated by x-ray crystaltruncation- rod scattering measurements. Two films, each of them respectively exhibited 1×1 and 2×2 periodicities in ultra high vacuum, were measured with the x-ray diffraction under ambient air. Both of the films showed essentially the same Laue peaks. The Laue peaks directly indicate that both films have the CsCl-type (so-called c-FeSi) structure whose stacking orientation is rotated by 180° with respect to the substrate. Quantitative structural analysis, which includes degree of the film roughness as fit parameters, reveals that the interfacial Fe atom is 8-fold coordinated to Si atoms (so-called B8 model). The determined interlayer spacing in the silicide film and the Fe-Si bond length at the interface are respectively ∼6 % and ∼9 % larger than those in the hypothetical c-FeSi.

本文言語English
ページ(範囲)513-517
ページ数5
ジャーナルe-Journal of Surface Science and Nanotechnology
7
DOI
出版ステータスPublished - 2009 4 11
外部発表はい

ASJC Scopus subject areas

  • バイオテクノロジー
  • バイオエンジニアリング
  • 凝縮系物理学
  • 材料力学
  • 表面および界面
  • 表面、皮膜および薄膜

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