Interaction of cesium with charged oxide under UV irradiation imaged by photoemission electron microscopy

Hirokazu Fukidome, Masamichi Yoshimura, Kazuyuki Ueda

研究成果: Article査読

1 被引用数 (Scopus)

抄録

We report the first observation of electron transfer from charged SiO2/Si(1 0 0) by ion-implantation via internal photoemission from Si by photoemission electron microscopy (PEEM) for the purpose of the microscopic control of promotion of catalyst by electron transfer from oxide support. The contrast of the PEEM image varies with the amount and kind of the implanted ion and the deposition of Cs through the formation of electrical double layer consisting of Cs+ and trapped electrons at trapping centers created by the implantation. It is then firmly established that oxide charging can be microscopically tuned by ion-implantation.

本文言語English
ページ(範囲)5309-5312
ページ数4
ジャーナルSurface Science
601
22
DOI
出版ステータスPublished - 2007 11 15
外部発表はい

ASJC Scopus subject areas

  • 凝縮系物理学
  • 表面および界面
  • 表面、皮膜および薄膜
  • 材料化学

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