Initial deflection of silicon-on-insulator thin membrane micro-mirror and fabrication of varifocal mirror

Takashi Sasaki, Kazuhiro Hane

研究成果: Article査読

20 被引用数 (Scopus)

抄録

Thin membranes fabricated from silicon-on-insulator (SOI) wafer are valuable for deformable mirrors. The mirror is controlled to generate a specific wave-front with precision smaller than a wavelength. Here, we investigate quantitatively the initial deflection of the thin membrane mirrors fabricated from SOI wafer, which are often used in micro-electro-mechanical systems. A 1-μm-thick and 450-μm-diameter mirror fabricated from SOI wafer deflects upward around the circumference at an angle of 0.12°. The maximum deflection of the mirror is 320 nm at the center. The stress conditions of the mirrors are analyzed on the basis of material strength theory. The deflection is explained by the residual stress of the buried oxide layer of SOI wafer. The in-plane stresses of the micro-mirrors of diameters from 450 μm to 860 μm range from compressive stress of 1.2 MPa to tensile stress of 2.1 MPa. Furthermore, based on the above experimental and theoretical analyses, a 1-μm-thick varifocal micro-mirror of the diameter of 400 μm is fabricated. The focus of the mirror is varied from -28 mm to 21 mm with the deviation smaller than 4 nm from parabola in the mirror central region.

本文言語English
ページ(範囲)516-522
ページ数7
ジャーナルSensors and Actuators, A: Physical
172
2
DOI
出版ステータスPublished - 2011 12

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • 器械工学
  • 凝縮系物理学
  • 表面、皮膜および薄膜
  • 金属および合金
  • 電子工学および電気工学

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