Infrared study of adsorption and thermal decomposition of Si2H6 on Si(100)

Masanori Shinohara, Michio Niwano, Yoichiro Neo, Kuniyoshi Yokoo

研究成果: Conference article査読

29 被引用数 (Scopus)

抄録

We have investigated the adsorption and thermal decomposition of disilane on Si(100) (2×1) using infrared absorption spectroscopy. We demonstrate that at room temperature, disilane dissociatively adsorbs onto the surface with the dimer bond unbroken, to produce mono-, di-, and tri-hydride species. At low coverages, the disilane molecule adsorbs on the surface without breaking the Si-Si bond of the molecule. Thermal annealing following room-temperature adsorption of disilane produces a hydrogen-terminated adatom dimer (HSi-SiH) and an isolated monohydride species. We suggest that these hydride species are generated through the rupture of the substrate dimer bonds. Hydrogen desorption from the isolated monohydride occurs at much lower temperature than that from the adatom dimer.

本文言語English
ページ(範囲)16-20
ページ数5
ジャーナルThin Solid Films
369
1
DOI
出版ステータスPublished - 2000 7月 3
外部発表はい
イベントThe International Joint Conference on Silicon Epitaxyand Heterostructures (IJC-SI) - Miyagi, Jpn
継続期間: 1999 9月 121999 9月 17

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • 表面および界面
  • 表面、皮膜および薄膜
  • 金属および合金
  • 材料化学

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