Infrared spectroscopy study of adsorption of silane on Si(0 0 1)

Masanori Shinohara, Yasuo Kimura, Mineo Saito, Michio Niwano

研究成果: Article査読

38 被引用数 (Scopus)


We used infrared absorption spectroscopy in the multiple internal reflection geometry to investigate the adsorption of SiH4 on the Si(0 0 1)(2 × 1) surface. Comparing infrared data with the density functional cluster calculation, we show that at low hydrogen coverage the silane molecule dissociatively adsorbs on Si(0 0 1)(2 × 1) to populate a dihydride (SiH2) at the bridge site between two adjacent dimers and monohydride species; monohydrides are formed by terminating the unsaturated dangling bonds of dimers by hydrogen atoms released from the silane molecule. We suggest that at high hydrogen coverage, silane adsorbs onto a single dimer to generate monohydride and sylil groups (-SiH3). We also demonstrate that the dihydride species that is initially generated by silane adsorption, decomposes to monohydride species even at room temperature.

ジャーナルSurface Science
出版ステータスPublished - 2002 4 10

ASJC Scopus subject areas

  • 凝縮系物理学
  • 表面および界面
  • 表面、皮膜および薄膜
  • 材料化学


「Infrared spectroscopy study of adsorption of silane on Si(0 0 1)」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。