Influence of Si surface roughness on electrical characteristics of MOSFET with HfON gate insulator formed by ECR plasma sputtering

Dae Hee Han, Shun Ichiro Ohmi, Tomoyuki Suwa, Philippe Gaubert, Tadahiro Ohmi

研究成果: Article査読

8 被引用数 (Scopus)

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Physics

Chemistry

Engineering

Biochemistry, Genetics and Molecular Biology

Material Science