Influence of moisture on the CVD formation of a MnOx barrier layer

K. Neishi, K. Matsumoto, H. Sato, H. Itoh, S. Hosaka, Junichi Koike

研究成果: Conference contribution

1 被引用数 (Scopus)

抄録

We investigated the effects of moisture on the deposition behavior of the MnOx diffusion barrier layer on TEOS-oxide substrates. The moisture effects were investigated in two ways: (1) with and without the introduction of H2O gas in the reaction chamber and (2) with and without pre-annealing of the TEOS-oxide substrates without introducing H2O gas. A thick crystalline MnOx layer was formed under the presence of H2O gas. A thin amorphous MnOx layer was formed without H2O gas. Without H2O gas in the reaction chamber, the thickness of the MnOx layer was slightly thinner on the substrate with pre-annealing than on the substrate without annealing.

本文言語English
ホスト出版物のタイトルAdvanced Metallization Conference 2008, AMC 2008
ページ307-311
ページ数5
出版ステータスPublished - 2009 10月 19
イベントAdvanced Metallization Conference 2008, AMC 2008 - San Diego, CA, United States
継続期間: 2008 9月 232008 9月 25

出版物シリーズ

名前Advanced Metallization Conference (AMC)
ISSN(印刷版)1540-1766

Other

OtherAdvanced Metallization Conference 2008, AMC 2008
国/地域United States
CitySan Diego, CA
Period08/9/2308/9/25

ASJC Scopus subject areas

  • 材料科学(全般)
  • 産業および生産工学

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