Influence of ion irradiation effects on the hydriding behavior of nanocrystalline Mg-Ni films

E. Wirth, D. Milcius, L. L. Pranevicius, D. Noreus, T. Sato, C. Templier

研究成果: Article査読

9 被引用数 (Scopus)

抄録

Mg-Ni films were grown on a silicon substrate using two magnetron sputter deposition sources and simultaneous Ar ion irradiation. X-ray diffraction microstructure and phase composition, EDX elemental composition and atomic force microscopy surface topography analysis showed that under low-energy Ar ion irradiation (bias voltages from 0 to -120 V), the Mg2Ni phase was dominant and on the contrary with the increase of ion energy (bias voltages from -120 to -200 V), the MgNi2 phase appeared. The Mg content changed from 63 at% down to 42 at% in films grown under bias voltages of 0 and -200 V, respectively. During hydrogenation at 8 bar, 270 °C for 3 h, films with a dominant phase of Mg2Ni were transformed into Mg2NiH4. Hydrogen in MgNi2 films was mainly in interstitials and tended to form bubbles.

本文言語English
ページ(範囲)1224-1228
ページ数5
ジャーナルVacuum
81
10
DOI
出版ステータスPublished - 2007 6 15
外部発表はい

ASJC Scopus subject areas

  • 器械工学
  • 凝縮系物理学
  • 表面、皮膜および薄膜

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