Influence of Cleanliness of Sputtering Atmosphere on Magnetic Properties of Thin Films for Ultra High Density Magnetic Recording Devices

Migaku Takahashi

    研究成果: Article査読

    3 被引用数 (Scopus)

    抄録

    The ultra clean sputtering process (UC-process) was introduced in the fabrication of thin film media and spin valve type Ni-Fe/25 at% Ni-Mn/Ni-Fe tri-layered films. As a result, the UC process enables the control of the fine structure of the thin films and resulted in excellent magnetic properties. This study demonstrates that the UC-process is superior to the normal process presently used and plays an important role for the thin film media and spin valve head fabrication.

    本文言語English
    ページ(範囲)851-855
    ページ数5
    ジャーナルShinku/Journal of the Vacuum Society of Japan
    41
    10
    DOI
    出版ステータスPublished - 1998 10

    ASJC Scopus subject areas

    • 凝縮系物理学
    • 表面、皮膜および薄膜
    • 電子工学および電気工学

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