Industrial application of atom probe tomography to semiconductor devices

Alexander Devin Giddings, Sebastian Koelling, Yasuo Shimizu, Robert Estivill, Koji Inoue, Wilfried Vandervorst, Wai Kong Yeoh

研究成果: Article査読

7 被引用数 (Scopus)

抄録

Advanced semiconductor devices offer a metrology challenge due to their small feature size, diverse composition and intricate structure. Atom probe tomography (APT) is an emerging technique that provides 3D compositional analysis at the atomic-scale; as such, it seems uniquely suited to meet these challenges. However, the semiconductor industry has demanding requirements against which the techniques in use are evaluated. This article explores the use of APT in the semiconductor industry, showing the potential of the technique, the obstacles that occur in practise, and possible future developments.

本文言語English
ページ(範囲)82-90
ページ数9
ジャーナルScripta Materialia
148
DOI
出版ステータスPublished - 2018 4 15

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering
  • Metals and Alloys

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