The induced uniaxial anisotropy field Hk in very thin films sandwiched by Ta or Cu layers was investigated. The value of Hk of the Ta/Cu/Ni79Fe21/Cu/Ta film decreases as film thickness decreases below 20 nm, even after an annealing procedure in a magnetic field. This Hk reduction is similar to that of the Ta/Ni79 Fe21/Ta films, indicating that the Hk reduction is independent of surface energy and/or crystal structure of seed layers. The value of film magnetostriction λp-p of the Ta/NiFe/Ta films gradually increases as the thickness decreases, which is coincident with the reduction of Hk. However, the increase of the λp-p values, by decreasing Ni concentration or annealing the films, resulted in conflicting Hk values. These results indicate that the Hk reduction in thin films is not simply caused by the magnetostrictive effect.
|ジャーナル||IEEE Transactions on Magnetics|
|出版ステータス||Published - 2001 7|
|イベント||8th Joint Magnetism and Magnetic Materials -International Magnetic Conference- (MMM-Intermag) - San Antonio, TX, United States|
継続期間: 2001 1 7 → 2001 1 11
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