Induced uniaxial magnetic anisotropy and film magnetostriction in very thin permalloy films

H. Katada, T. Shimatsu, I. Watanabe, H. Muraoka, Y. Nakamura, Y. Sugita

研究成果: Conference article査読

15 被引用数 (Scopus)

抄録

The induced uniaxial anisotropy field Hk in very thin films sandwiched by Ta or Cu layers was investigated. The value of Hk of the Ta/Cu/Ni79Fe21/Cu/Ta film decreases as film thickness decreases below 20 nm, even after an annealing procedure in a magnetic field. This Hk reduction is similar to that of the Ta/Ni79 Fe21/Ta films, indicating that the Hk reduction is independent of surface energy and/or crystal structure of seed layers. The value of film magnetostriction λp-p of the Ta/NiFe/Ta films gradually increases as the thickness decreases, which is coincident with the reduction of Hk. However, the increase of the λp-p values, by decreasing Ni concentration or annealing the films, resulted in conflicting Hk values. These results indicate that the Hk reduction in thin films is not simply caused by the magnetostrictive effect.

本文言語English
ページ(範囲)2334-2336
ページ数3
ジャーナルIEEE Transactions on Magnetics
37
4 I
DOI
出版ステータスPublished - 2001 7
イベント8th Joint Magnetism and Magnetic Materials -International Magnetic Conference- (MMM-Intermag) - San Antonio, TX, United States
継続期間: 2001 1 72001 1 11

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • 電子工学および電気工学

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