In situ observation of formation processes of titanium compound thin films due to ion implantation in a transmission electron microscope

Y. Kasukabe, Z. L. Dizard, Y. Fujino, H. Tani, M. Osaka, Y. Yamada, H. Abe

研究成果: Conference article査読

3 被引用数 (Scopus)

抄録

Ions (C+, N2+ and O+) implantation into evaporated Ti films was performed in the transmission electron microscope (TEM). Ti films grown on NaCl (001) surfaces at room temperature consisted mainly of (03·5)-oriented hcp-Ti and (110)-oriented CaF2-type TiHx. NaCl-type Ti compounds of (001)-oriented TiCz, TiNy and TiOu were epitaxially formed by the transformation of (03·5)-oriented hcp-Ti to (001)-oriented fcc-Ti sublattices and the occupation of the octahedral (O-) sites by implanted ions, whereas (110)-oriented Ti compounds were formed from a (110)-oriented TiHx without structural transformation of Ti sublattices. Observations of EELS elucidated that, in the early N-implanting stage, the variation of the energy of the loss peak due to plasmon excitation of the areas where TiHx grew in the as-evaporated Ti films was different from that of the areas where hcp-Ti grew. Analysis of Mulliken bond overlap populations indicated that the occupation of O-sites by N atoms gives rise to weakening of Ti-Ti bonds and forming of Ti-N covalent bonds.

本文言語English
ページ(範囲)390-394
ページ数5
ジャーナルNuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
206
DOI
出版ステータスPublished - 2003 5
イベント13th International conference on Ion beam modification of Mate - Kobe, Japan
継続期間: 2002 9 12002 9 6

ASJC Scopus subject areas

  • 核物理学および高エネルギー物理学
  • 器械工学

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