TY - JOUR
T1 - In situ observation of chemical vapour-deposited titanium oxide films by double-modulation infrared emission spectrometry
AU - Wadayama, Toshimasa
AU - Mizuseki, Hiroshi
AU - Hatta, Aritada
N1 - Funding Information:
This work was supportedi n part by a Grant-in-Aid for Encouragement of Young Scientists (T.W.; No. 02855171f)r om the Ministry of Education, Science and Culture of Japan. T.W. ex-pressesh is thanks to Iketani Science and Technology Foundation for financial support of this work.
PY - 1991/12/12
Y1 - 1991/12/12
N2 - Double-modulation infrared emission spectrometry was applied to the in situ observation of titanium oxide films grown on gold substrates from a mixture of tetraisopropoxytitanium and oxygen under controlled gaseous pressure and substrate temperature. The emission band associated with the formation of TiO bonds shifts continuously towards higher frequencies with deposition time over the range 870-920 cm-1. Structures of the films are discussed through a comparison between the observed and calculated emission spectra and by x-ray diffraction analysis. It was found that the film growth is relatively slow in the early stage of the deposition. Further, it is shown that UV illumination facilities the growth of the film. Some possibilities for this origin are discussed.
AB - Double-modulation infrared emission spectrometry was applied to the in situ observation of titanium oxide films grown on gold substrates from a mixture of tetraisopropoxytitanium and oxygen under controlled gaseous pressure and substrate temperature. The emission band associated with the formation of TiO bonds shifts continuously towards higher frequencies with deposition time over the range 870-920 cm-1. Structures of the films are discussed through a comparison between the observed and calculated emission spectra and by x-ray diffraction analysis. It was found that the film growth is relatively slow in the early stage of the deposition. Further, it is shown that UV illumination facilities the growth of the film. Some possibilities for this origin are discussed.
KW - Chemical vapour deposition
KW - Double modulation
KW - Infrared spectrometry
KW - Titanium oxide films
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U2 - 10.1016/0924-2031(91)85031-H
DO - 10.1016/0924-2031(91)85031-H
M3 - Article
AN - SCOPUS:44949272075
SN - 0924-2031
VL - 2
SP - 239
EP - 244
JO - Vibrational Spectroscopy
JF - Vibrational Spectroscopy
IS - 4
ER -