In-situ chemical vapor deposition of alumina catalyst bed on a suspended membrane microreactor

Tomokazu Takahashi, Shuji Tanaka, Kuei Sung Chang, Masayoshi Esashi

研究成果: Conference contribution

1 被引用数 (Scopus)

抄録

This paper describes in-situ chemical vapor deposition (CVD) method to deposit alumna catalyst bed selectively on the suspended membrane of a microreactor. The microreactor with suspended membrane structure can realize good thermal isolation of the reaction area on the membrane, because heat conduction through the thin suspended membrane is quite small. However, it is difficult to form catalyst selectively on the suspended membrane. The solution can be given by the in-situ CVD method, by which alumina is deposited from alumina precursor selectively on the suspended membrane heated by integrated micro-heaters. We fabricated the suspended-membrane microreactors, and set up an in-situ CVD system using aluminum tri-isopropoxide (Al[(CH3) 2CHO]3) as the precursor. Preliminary deposition tests were preformed. The deposits were observed using a scanning electron microscope (SEM), and the composition of the deposits was analyzed by energy dispersive spectroscopy (EDX).

本文言語English
ホスト出版物のタイトルTRANSDUCERS '05 - 13th International Conference on Solid-State Sensors and Actuators and Microsystems - Digest of Technical Papers
ページ899-903
ページ数5
DOI
出版ステータスPublished - 2005 11 9
イベント13th International Conference on Solid-State Sensors and Actuators and Microsystems, TRANSDUCERS '05 - Seoul, Korea, Republic of
継続期間: 2005 6 52005 6 9

出版物シリーズ

名前Digest of Technical Papers - International Conference on Solid State Sensors and Actuators and Microsystems, TRANSDUCERS '05
1

Other

Other13th International Conference on Solid-State Sensors and Actuators and Microsystems, TRANSDUCERS '05
CountryKorea, Republic of
CitySeoul
Period05/6/505/6/9

ASJC Scopus subject areas

  • Engineering(all)

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