In situ chemical state analysis of buried polymer/metal adhesive interface by hard X-ray photoelectron spectroscopy

Kenichi Ozawa, Takashi Kakubo, Katsunori Shimizu, Naoya Amino, Kazuhiko Mase, Eiji Ikenaga, Tetsuya Nakamura, Toyohiko Kinoshita, Hiroshi Oji

研究成果: Article査読

11 被引用数 (Scopus)

抄録

Chemical state analysis of adhesive interfaces is important to understand an adhesion mechanism between two different materials. Although photoelectron spectroscopy (PES) is an ideal tool for such an analysis, the adhesive interfaces must be exposed to the surface because PES is essentially a surface sensitive technique. However, an in situ observation is possible by hard X-ray PES (HAXPES) owing to its large probing depth. In the present study, HAXPES is applied to investigate the adhesive interface between rubber and brass without exposing the interface. It is demonstrated that copper sulfides formed at the buried rubber/brass interface are distinguished from S-containing species in the rubber overlayer. The chemical state of the buried interface is compared with that of the "exposed" interface prepared by so-called a filter-paper method.

本文言語English
ページ(範囲)177-182
ページ数6
ジャーナルApplied Surface Science
320
DOI
出版ステータスPublished - 2014 11 30
外部発表はい

ASJC Scopus subject areas

  • 化学 (全般)
  • 凝縮系物理学
  • 物理学および天文学(全般)
  • 表面および界面
  • 表面、皮膜および薄膜

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