Improvement in film quality of epitaxial graphene on SiC(111)/Si(111) by SiH 4 pretreatment

Shota Sanbonsuge, Shunsuke Abe, Hiroyuki Handa, Ryota Takahashi, Kei Imaizumi, Hirokazu Fukidome, Maki Suemitsu

研究成果: Article査読

6 被引用数 (Scopus)

抄録

The epitaxy of graphene on 3C-SiC/Si (GOS) has attracted much attention owing to its viability to fuse graphene with Si-based technologies. It is known that the surface condition of the 3C-SiC thin film before graphitization plays a decisive role in determining the quality of the GOS film. We have investigated the effect of the pretreatment of the 3C-SiC thin film in vacuo at a SiH 4 partial pressure of 6.7 × 10 -4 Pa on the subsequent formation of graphene. As a result, it is revealed that the SiH 4 pretreatment restores the defects on the SiC surface, such as the Si vacancy and point defects formed by the presence of native oxides, and improves the quality of graphene. The effect is found to be highest when the substrate temperature is 1173 K.

本文言語English
論文番号06FD10
ジャーナルJapanese journal of applied physics
51
6 PART 2
DOI
出版ステータスPublished - 2012 6

ASJC Scopus subject areas

  • 工学(全般)
  • 物理学および天文学(全般)

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