Impact of carbon co-implantation on boron distribution and activation in silicon studied by atom probe tomography and spreading resistance measurements

Yasuo Shimizu, Hisashi Takamizawa, Koji Inoue, Fumiko Yano, Shuichi Kudo, Akio Nishida, Takeshi Toyama, Yasuyoshi Nagai

研究成果: Article査読

14 被引用数 (Scopus)

フィンガープリント

「Impact of carbon co-implantation on boron distribution and activation in silicon studied by atom probe tomography and spreading resistance measurements」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

Engineering & Materials Science

Physics & Astronomy