Imaging wurtzite GaN surfaces by molecular beam epitaxy-scanning tunneling microscopy

Q. K. Xue, Q. Z. Xue, S. Kuwano, T. Sakurai, T. Ohno, I. S.T. Tsong, X. G. Qiu, Y. Segawa

    研究成果: Conference article査読

    13 被引用数 (Scopus)

    抄録

    Using scanning tunneling microscopy (STM), reflection high-energy electron diffraction (RHEED) and first-principles total-energy calculations, we have investigated the surface reconstructions that occurred on the basal planes of wurtzite GaN. Depending on the substrate used, two distinct classes of reconstructions, which correspond to the different surface polarities of the hexagonal GaN, have been established. The Ga-polar surface forms on the Si-terminated 6H-SiC and displays the 10 × 10, 5√3 × 2√13, '5 × 2.5', 4 × 4, √7 × √7, 2 × 2 and 1 × 1. On the (0001̄) N-polar face grown on the C-terminated 6H-SiC substrate, three phases of 2√7 × 2√7, 6 × 6 and 2 × 4 are identified. Irrespective of surface polarity, all these phases are found to be Ga-rich. We will show that their structure is consistent with a simple Ga-adatom-based scheme. We will further show that the well-known electron counting model and structural motifs for the conventional III-V semiconductor reconstructed surfaces are insufficient to explain surface stability, and additional electron collective effects have to be considered in the case of GaN.

    本文言語English
    ページ(範囲)149-158
    ページ数10
    ジャーナルThin Solid Films
    367
    1-2
    DOI
    出版ステータスPublished - 2000 5 15
    イベント3rd International Workshop MBE-GPT'99 - Warsaw, Poland
    継続期間: 1999 5 231999 5 28

    ASJC Scopus subject areas

    • 電子材料、光学材料、および磁性材料
    • 表面および界面
    • 表面、皮膜および薄膜
    • 金属および合金
    • 材料化学

    フィンガープリント

    「Imaging wurtzite GaN surfaces by molecular beam epitaxy-scanning tunneling microscopy」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

    引用スタイル