Hydrogenated amorphous carbon films deposited by low-frequency plasma chemical vapor deposition at room temperature

M. Shimozuma, G. Tochitani, H. Ohno, H. Tagashira, J. Nakahara

研究成果: Article査読

18 被引用数 (Scopus)

抄録

Hydrogenated amorphous carbon (a-C:H) films were prepared at room temperature by low-frequency (50-Hz) plasma chemical vapor deposition using CH4 and H2. The a-C:H films were transparent, highly resistive, and very uniform. Infrared absorption measurements, as well as Raman spectroscopy, indicated that the C bonding in the a-C:H films was predominantly sp3. Moreover, the optical band gap of the a-C:H films was measured.

本文言語English
ページ(範囲)447-449
ページ数3
ジャーナルJournal of Applied Physics
66
1
DOI
出版ステータスPublished - 1989
外部発表はい

ASJC Scopus subject areas

  • 物理学および天文学(全般)

フィンガープリント

「Hydrogenated amorphous carbon films deposited by low-frequency plasma chemical vapor deposition at room temperature」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

引用スタイル