Hydrogen retention induced by ion implantation in tungsten trioxide films

Aichi Inouye, Shunya Yamamoto, Shinji Nagata, Masahito Yoshikawa, Tatsuo Shikama

研究成果: Article査読

10 被引用数 (Scopus)

抄録

The relation between hydrogen retention and optical properties of an amorphous tungsten trioxide (WO3) film was investigated using 10 keV H2+ ion implantation. WO3 films (350 nm) covered by W layers (200 nm) were deposited on SiO2 glass substrates by sputtering in a mixture of Ar and O2 gases. The hydrogen concentration in the WO3 film was characterized by elastic recoil detection analysis (ERDA). The hydrogen concentration in the WO3 film increased by 0.4 H/W in proportion to the fluence of the H2+ ions implanted into the W layer. The optical absorption coefficient of the film at 750 nm increased linearly by 3 μm-1 with an increase in the concentration of the implanted hydrogen up to 0.1 H/W, and saturated at 4 μm-1 with the concentration higher than 0.1 H/W. These results indicate that the introduced hydrogen up to a hydrogen concentration of 0.1 H/W can be monitored by measuring the optical absorbance in the WO3 films.

本文言語English
ページ(範囲)1480-1483
ページ数4
ジャーナルNuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
267
8-9
DOI
出版ステータスPublished - 2009 5 1

ASJC Scopus subject areas

  • Nuclear and High Energy Physics
  • Instrumentation

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