HRTEM and EELS characterization of atomic and electronic structures in Cu/α-Al 2 O 3 interfaces

T. Sasaki, T. Mizoguchi, K. Matsunaga, S. Tanaka, T. Yamamoto, M. Kohyama, Y. Ikuhara

研究成果: Article査読

29 被引用数 (Scopus)

抄録

Interfacial atomic structures of Cu/Al 2 O 3 (0 0 0 1) and Cu/Al 2 O 3 (1 1 2̄ 0) prepared by the pulsed-laser deposition technique were characterized by high-resolution transmission electron microscopy (HRTEM). It was found that (1 1 1) and (0 0 1) planes of Cu were epitaxially oriented to Al 2 O 3 (0 0 0 1) and Al 2 O 3 (1 1 2̄ 0) planes, respectively. Chemical bonding states at the interfaces were analysed by electron energy-loss spectroscopy (EELS). In oxygen-K edge energy-loss near-edge structure (O-K ELNES) of the Cu/Al 2 O 3 (0 0 0 1) and Cu/Al 2 O 3 (1 1 2̄ 0) interfaces, a shoulder peak appeared at the lower energy side of the main peak. This indicates that Cu-O interactions were formed across these Cu/Al 2 O 3 interfaces. In fact, the simulated HRTEM images based on the O-terminated interface models agreed well with the experimental ones. It can be concluded that the O-terminated interfaces were formed in the present Cu/Al 2 O 3 interfaces.

本文言語English
ページ(範囲)87-90
ページ数4
ジャーナルApplied Surface Science
241
1-2 SPEC. ISS.
DOI
出版ステータスPublished - 2005 2 28
外部発表はい

ASJC Scopus subject areas

  • 化学 (全般)
  • 凝縮系物理学
  • 物理学および天文学(全般)
  • 表面および界面
  • 表面、皮膜および薄膜

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