Highly angle-resolved X-ray photoelectron diffraction from solid surfaces

K. Tamura, S. Shiraki, H. Ishii, M. Owari, Y. Nihei

    研究成果: Article査読

    2 被引用数 (Scopus)

    抄録

    We have carried out the highly angle-resolved X-ray photoelectron diffraction (XPED) measurements by using the input-lens system for restriction of the detection angle. In the input-lens system, high angular resolution and high throughput are accomplished by placing an aperture not on the image plane but on the diffraction plane of electron optics. The aperture sizes (φ4 mm, φ2 mm, φ0.5 mm, φ0.25 mm) correspond to the angular resolutions (±0.6°, ±0.3°, ±0.08°, ±0.04°) respectively. Highly angle-resolved Ge3d XPED patterns from Ge(111) obtained by the angle-resolving system contain fine structure such as Kikuchi patterns. The fine structure was reproduced by multiple scattering cluster calculations.

    本文言語English
    ページ(範囲)257-261
    ページ数5
    ジャーナルSurface Review and Letters
    10
    2-3
    DOI
    出版ステータスPublished - 2003 1 1

    ASJC Scopus subject areas

    • Condensed Matter Physics
    • Surfaces and Interfaces
    • Surfaces, Coatings and Films
    • Materials Chemistry

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