High-speed deposition of dense, dendritic and porous SiO2 films by Nd: YAG laser chemical vapor deposition

Jun Endo, Akihiko Ito, Teiichi Kimura, Takashi Goto

研究成果: Article査読

12 被引用数 (Scopus)

抄録

Dense, dendritic and porous SiO2 films were prepared by laser chemical vapor deposition (LCVD) using a high-power continuous-wave mode Nd: YAG laser (206 W) and a TEOS (tetraethyl orthosilicate) precursor. The effects of laser power (PL) and total chamber pressure (Ptot) on the microstructure and deposition rate (Rdep) were investigated. Amorphous SiO2 films were obtained independent of PL and Ptot. Flame formation was observed between the nozzle and the substrate at PL > 160 W and Ptot > 15 kPa. At PL = 206 W, dense, dendritic and porous SiO2 films were obtained at Ptot < 20 kPa, Ptot = 23 kPa and Ptot > 25 kPa, respectively. The Rdep increased thousands of times under flame formation conditions, the highest Rdep being reached at 1200 μm h-1, 22,000 μm h-1 and 28,000 μm h-1 for the dense, dendritic and porous SiO2 films, respectively.

本文言語English
ページ(範囲)225-229
ページ数5
ジャーナルMaterials Science and Engineering B: Solid-State Materials for Advanced Technology
166
3
DOI
出版ステータスPublished - 2010 2 15

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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