High-resolution photoemission study of UNi2Al3 and URu2Si2

S. H. Yang, H. Kumigashira, T. Yokoya, A. Chainani, N. Sato, T. Komatsubara, S. J. Oh, T. Takahashi

研究成果: Article査読

6 被引用数 (Scopus)

抄録

High-resolution low-temperature photoemission spectroscopy was performed for UNi2Al3 and URu2Si2 to study the nature of 5f electrons in U-based heavy fermion materials. Photoemission spectra of both compounds have a sharp peak at EF and a large broad peak around 2 eV, while only UNi2Al3 exhibits an additional small broad feature at 0.6 eV. The two features in the vicinity of EF (the EF-peak and the small structure at 0.6 eV) were found to have a dominant U 5f character. Comparison with the band structure calculations and experimental results on UPd2Al3 suggests that the EF-peak is ascribed to itinerant U 5f electrons while the following broad feature at 0.6 eV represents localized f electrons.

本文言語English
ページ(範囲)143-145
ページ数3
ジャーナルJournal of Electron Spectroscopy and Related Phenomena
78
出版ステータスPublished - 1996 5月

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • 放射線
  • 原子分子物理学および光学
  • 凝縮系物理学
  • 分光学
  • 物理化学および理論化学

フィンガープリント

「High-resolution photoemission study of UNi2Al3 and URu2Si2」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

引用スタイル