In this paper, we present a new method of waveguide-type device fabrication using an optical polymer. This method is applied to the fabrication of a grating on top of a polymeric waveguide film where, we used a mixture of pentaerythritol triacrylate. N- methyldiethanolamin, and eosin as a polymer material. This mixture, called henceforward PNME, acts as a negative-type photoresist polymeric material. Exposure of the material to light of specific wavelength makes the material solidify. Using this particular property of PNME and the fact that before the solidification PNME material is liquid, and thus copies the volume of the vessel where it is contained, we were able to fabricate polymeric films and waveguides with a relief grating on their surfaces. It was also determined that the interface between the side walls of the vessel and the PNME material plays a vital role in the fabrication process. Moreover, the presented method of fabrication is a high-resolution, high-output, and low-cost method of optical device fabrication and thus it is particularly suitable for commercial use.
|ジャーナル||Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers|
|出版ステータス||Published - 2003 4 1|
ASJC Scopus subject areas
- Physics and Astronomy (miscellaneous)