High-performance and damage-free neutral beam etching

S. Samukawa, K. Sakamoto, K. Ichiki

研究成果: Conference contribution

抄録

We propose high efficient neutral beam generation by using negative ions in a neutral beam source. We found that high flux and low energy neutral beams could be generated by efficiently neutralizing negative ions in the pulsed ICP passing through a carbon plate having high aspect ratio apertures. We expect that accurate, damage-free etching processes can be achieved by using our newly developed neutral beam generation system.

本文言語English
ホスト出版物のタイトル2002 7th International Symposium on Plasma- and Process-Induced Damage, P2ID 2002
編集者Calvin T. Gabriel, Terence Hook, Koji Eriguchi
出版社Institute of Electrical and Electronics Engineers Inc.
ページ126-129
ページ数4
ISBN(電子版)0965157776
DOI
出版ステータスPublished - 2002 1 1
イベント7th International Symposium on Plasma- and Process-Induced Damage, P2ID 2002 - Maui, United States
継続期間: 2002 6 52002 6 7

出版物シリーズ

名前International Symposium on Plasma Process-Induced Damage, P2ID, Proceedings
2002-January

Other

Other7th International Symposium on Plasma- and Process-Induced Damage, P2ID 2002
CountryUnited States
CityMaui
Period02/6/502/6/7

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials
  • Materials Chemistry
  • Condensed Matter Physics

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