High-index fluoride materials for 193 nm immersion lithography

Teruhiko Nawata, Yoji Inui, Isao Masada, Eiichi Nishijima, Toshiro Mabuchi, Naoto Mochizuki, Hiroki Sato, Tsuguo Fukuda

研究成果: Conference contribution

2 被引用数 (Scopus)

抄録

BaLiF3 single crystal has been studied as the lens material for the candidate of the next generation high index immersion lithography system. Although the refractive index of BaLiF3 is 1.64 at 193nm which is not sufficient for the requirement, other optical properties such as 193nm transparency and laser durability might fulfill the requirement, and intrinsic birefringence is relatively lower than other candidate materials. It is estimated that the cause of scattering in the BaLiF3 crystal is aggregation of excess LiF component. The special annealing process to eliminate excess LiF component was applied to improve the transparency. The internal transparency was improved to more than 97%/cm by optimizing growth conditions and annealing conditions.

本文言語English
ホスト出版物のタイトルOptical Microlithography XX
PART 2
DOI
出版ステータスPublished - 2007 10 15
イベントOptical Microlithography XX - San Jose, CA, United States
継続期間: 2007 2 272007 3 2

出版物シリーズ

名前Proceedings of SPIE - The International Society for Optical Engineering
番号PART 2
6520
ISSN(印刷版)0277-786X

Conference

ConferenceOptical Microlithography XX
国/地域United States
CitySan Jose, CA
Period07/2/2707/3/2

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • 凝縮系物理学
  • コンピュータ サイエンスの応用
  • 応用数学
  • 電子工学および電気工学

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