Hard X-ray photoelectron spectroscopy analysis for organic-inorganic hybrid materials formation

Ken Cho, Kosuke Takenaka, Yuichi Setsuhara, Masaharu Shiratani, Makoto Sekine, Masaru Hori, Eiji Ikenaga, Hiroki Kondo, Osamu Nakatsuka, Shigeaki Zaima

研究成果: Conference contribution

4 被引用数 (Scopus)

抄録

Interactions of nitrogen plasmas with polymer surfaces were investigated using hard x-ray photoelectron spectroscopy (HXPES) to complete depth analyses of the chemical bonding states in the nano-surface layer of polymethylmethacrylate (PMMA) films via. The PMMA films were exposed to the nitrogen plasmas sustained via inductive coupling of radio-frequency (RF) power with multiple low-inductance antenna (LIA) modules. The etching rate of the PMMA films was 38 nm/min. The surface roughness of PMMA increased from 0.3 nm to 0.7 nm with increased exposure time. The HXPES was carried out for non-destructive depth analysis of chemical bonding states in the nano-surface layer of PMMA films. The HXPES results indicated that nitrogen functionalities were formed in the shallower regions up to about 27 nm from the surface without showing significant degradation of the molecular structure of PMMA due to nitrogen plasma exposure.

本文言語English
ホスト出版物のタイトルCharacterization and Control of Interfaces for High Quality Advanced Materials III - Proc. 3rd Int. Conf. on Characterization and Control of Interfaces for High Quality Advanced Materials,ICCCI2009
出版社American Ceramic Society
ページ183-188
ページ数6
ISBN(印刷版)9780470909171
DOI
出版ステータスPublished - 2010 1 1
イベント3rd International Conference on Characterization and Control of Interfaces for High Quality Advanced Materials, ICCCI2009 - Kurashiki, Japan
継続期間: 2009 9 62009 9 9

出版物シリーズ

名前Ceramic Transactions
219
ISSN(印刷版)1042-1122

Other

Other3rd International Conference on Characterization and Control of Interfaces for High Quality Advanced Materials, ICCCI2009
国/地域Japan
CityKurashiki
Period09/9/609/9/9

ASJC Scopus subject areas

  • セラミックおよび複合材料
  • 材料化学

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