Growth process and structural disorder of reactively-sputtered a-Si:H/a-SiNx multilayer films

I. Honma, H. Komiyama, K. Tanaka

研究成果: Article査読

抄録

First observation is reported of the deposition rate dependence of Raman-detected structural disorder in a-Si:H/a-SiNx semiconductor superlattices. FWHM of TO-like Raman peak of a-Si (H-free) as well as a-Si:H becomes narrow with a decrease in the deposition rate, but the narrowing in a-Si:H occurs more rapidly compared to that in a-Si. It suggests that hydrogen coverage over the growing surface does enhance the structural relaxation velocity of disordered network. It is also demonstrated that structure-relaxation time of the order of a second is included in the growth of a-Si:H/a-SiNx multilayer structures.

本文言語English
ページ(範囲)726-728
ページ数3
ジャーナルJournal of Non-Crystalline Solids
114
PART 2
DOI
出版ステータスPublished - 1989 12 2
外部発表はい

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Ceramics and Composites
  • Condensed Matter Physics
  • Materials Chemistry

フィンガープリント 「Growth process and structural disorder of reactively-sputtered a-Si:H/a-SiNx multilayer films」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

引用スタイル