Growth of ZnO nanowires in hollow-type magnetron O2/Ar RF plasma

Hideki Ono, Satoru Iizuka

研究成果: Article査読

7 被引用数 (Scopus)

抄録

In this study we investigate how the sputtering of zinc from a zinc target is influenced by the properties of O2/Ar plasma when the discharge parameters such as gas pressure ratio and target bias voltage are changed. We also investigate plasma conditions for the formation of ZnO nanowires that are created and deposited on the substrate. We found that a plasma condition with strong optical emission from Zn neutrals is an important factor for the deposition of ZnO nanowires. Both the growth of nanowires and the emission intensity from Zn strongly depend on the partial pressure of oxygen.

本文言語English
ページ(範囲)1016-1019
ページ数4
ジャーナルThin Solid Films
518
3
DOI
出版ステータスPublished - 2009 12 30

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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