抄録
The phase errors in electron-beam-written step-chirped masks can be reduced by using a method based on the continuous movement approach and overwriting a pattern at the same place on the substrate several times. The group delay ripple of chirped fiber Bragg gratings fabricated by a four-times-overwritten phase mask is comparable with that of gratings obtained using a holographically written chirped phase mask.
本文言語 | English |
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ページ(範囲) | 816-818 |
ページ数 | 3 |
ジャーナル | IEEE Photonics Technology Letters |
巻 | 12 |
号 | 7 |
DOI | |
出版ステータス | Published - 2000 7月 |
外部発表 | はい |
ASJC Scopus subject areas
- 電子材料、光学材料、および磁性材料
- 原子分子物理学および光学
- 電子工学および電気工学