Group delay ripple reduction and reflectivity increase in a chirped fiber Bragg grating by multiple-overwriting of a phase mask with an electron-beam

Tetsuro Komukai, Tetsuro Inui, Masataka Nakazawa

研究成果: Article査読

20 被引用数 (Scopus)

抄録

The phase errors in electron-beam-written step-chirped masks can be reduced by using a method based on the continuous movement approach and overwriting a pattern at the same place on the substrate several times. The group delay ripple of chirped fiber Bragg gratings fabricated by a four-times-overwritten phase mask is comparable with that of gratings obtained using a holographically written chirped phase mask.

本文言語English
ページ(範囲)816-818
ページ数3
ジャーナルIEEE Photonics Technology Letters
12
7
DOI
出版ステータスPublished - 2000 7月
外部発表はい

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • 原子分子物理学および光学
  • 電子工学および電気工学

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